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Electronic gases are used for micro electric manufacturing or for semiconductor processing applications like thin film deposition- including physical vapor deposition and chemical vapor deposition, etching, packaging, RTP, or soldering. Electronic gases can either be pure gases or gas mixtures. Oxygen is used for the oxidation of silicon, one of the most critical processes in all of semiconductor manufacturing. Argon is used to provide an inert environment for sputter deposition of metals (where even nitrogen is too reactive and leads to the formation of metal nitrides).

  • Acetylene
  • Ammonia
  • Argon
  • Arsine
  • Boron trichloride
  • Boron trifluoride
  • Carbon dioxide
  • Chlorine
  • Chloropentafluoroethane
  • Deuterium
  • Diborane
  • Dichlorosilane
  • 1,2-Dichlorotetrafluoro ethane
  • Difluoromethane
  • Fluorine
  • Fluoromethane
  • Helium
  • Hexafluoroethane
  • Hydrogen
  • Hydrogen bromide
  • Hydrogen chloride
  • Hydrogen fluoride
  • Hydrogen iodide
  • Hydrogen sulfide
  • Krypton
  • Methyl chloride
  • Neon
  • Nitric oxide
  • Nitrogen
  • Nitrogen trifluoride
  • Nitrous oxide
  • Octafluoropropane
  • Oxygen
  • Phosphine
  • Silane
  • Silicon tetrachloride
  • Silicon tetrafluoride
  • Sulfur hexafluoride
  • Tetrafluoromethane
  • Trichlorosilane
  • Trifluoromethane
  • Xenon


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