C₃F₈

Octafluoropropane (C₃F₈) is used for plasma etching. The chemical composition of C₃F₈ supplies a higher ratio of carbon to fluorine (C/F) than C₂F₆. When C₃F₈ is exposed to the RF field generated in the etch process, a gas plasma is produced that will etch silicon dioxide or silicon nitride with excellent selectivity.